US chipmaker Intel Corp. last week revealed a new technology for making transistors which is said to improve the performance of its next round of processors by as much as 20%.Intel (INTC) disclosed the so-called SuperFin technology for its existing 10-nanometer (nm) chip process node, describing it as its largest single, intra-node enhancement in the company’s history, which promises to deliver performance improvement comparable to a full-node transition. The 10nm SuperFin technology combines Intel’s FinFET transistors with Super metal insulator metal capacitor, the company said.“It is 20%, the largest intra-node jump ever in our history,” Raja Koduri, Intel’s chief architect, …read more
Source:: Yahoo Finance
